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HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering

Categories Sputtering Targets
Brand Name: Jinxing
Model Number: TiAl Ti75Al25 Round Bar For Sputtering
Certification: ISO 9001:2008
Place of Origin: China
MOQ: 10kgs
Price: 10-100USD/kg
Payment Terms: L/C, T/T
Supply Ability: 10ton month
Delivery Time: 10days
Packaging Details: Standard exporting package
Purity: Al-Ti (35/65at%), Al/Ti (50:50 at%)
Shape: Discs, Plate, Step
Specification: Customized as request
Process: HIP
Name: Ti75Al25 Round Bar For Sputtering
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HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering

Ti75Al25 Round Bar For Sputtering


TiAl Target 75:25
Product Name: Titanium Aluminum target 75:25 at%

Titanium Aluminum 75:25 at%
TiAl targets are produced in a meltmetallurgical process.

Application
Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools.

Purity
Metallic purity ≥ 99.8%

Composition ratio
75:25 at%

Form of Delivery
Sputtering targets, arc cathodes, round targets up to ? 220 mm in one segment, rectangular targets up to a length of 1100 mm and a width of 200 mm in one segment.

Chemical Analysis in wt%
Fe <0.07
C <0.03
O <0.15
N <0.03
H <0.01
Tolerance of Al and Ti +/- 1 wt%

Physical Properties
Melting point: 1620°C
Density supplied: ≥ 4.18 g/cm3

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Quality HIP Process Ti75Al25 Titanium Aluminum Round Bar For Sputtering for sale
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