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Categories | PVD and PECVD DLC Coating System |
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Brand Name: | ROYAL |
Model Number: | Multi950 |
Certification: | CE |
Place of Origin: | China |
MOQ: | 1 set |
Price: | depends on |
Payment Terms: | L/C,T/T |
Supply Ability: | 10 sets per month |
Delivery Time: | 14~16weeks |
Packaging Details: | Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation. |
Equipment Model: | Polyhedron structure |
Deposition Sources: | arc + DC/MF sputtering |
Technology: | PECVD process, PVD plating |
Material: | SS304/SS316L |
Applications: | DLC, Hard films, optical film coating by Magnetron Sputtering |
Factory Location: | Shanghai city, China |
Worldwide Service: | Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America |
Training Service: | Machine operation, maintenance, coating process Recipes, program |
Warranty: | Limited warranty 1 year for free, whole life for machine |
OEM & ODM: | available, we support tailor made design and fabrication |
Company Info. |
SHANGHAI ROYAL TECHNOLOGY INC. |
Verified Supplier |
View Contact Details |
Product List |
The integration of PVD and PECVD technologies in a hybrid coating machine provides a range of advantages that can lead to improved coating quality, versatility, control, efficiency, cost savings, customization, and environmental sustainability.
The Multi950 is the milestone of advanced design coating systems for Royal Tech. Here, we grateful thanks Shanghai University students and especially Process Yigang Chen, his creative and selfless dedication are unlimited values and inspired our team.
In year 2018, we had another project cooperation with Pressor Chen,
the C-60 material deposition by
Inductive thermal evaporation method. We heartfully thank Mr. Yimou
Yang and Professor Chen's leading and instruction on every
innovative project.
Multi950 machine properties:
Compact Footprint,
Standard Modular Design,
Flexible,
Reliable,
Octal Chamber,
2-door structure for good access,
PVD + PECVD processes.
Design Features:
1. Flexibility: Arc and sputtering cathodes, Ion source mounting
flanges are standardized for flexible exchange;
2. Versatility: can deposit variety of base metals and alloys;
optical coatings, hard coatings, soft coatings, compound films and
solid lubricating films on the metallic and non-metallic materials
substrates.
3. Straight forward design: 2-door structure, front & back opening
for easy maintenance.
The Multi950 machine is a customized multiple functions vacuum
deposition system for R&D. With half year’s discussion with
Shanghai University’s team leaded by Professor Chen, we finally
confirmed the design and configurations to fulfill theirs R&D
applications. This system is able to deposit transparent DLC film
with PECVD process, hard coatings on tools, and optical film with
sputtering cathode. Based on this pilot machine design concept, we
have developed 3 other coating systems after then:
1. Bipolar Plate Coating for Fuel Cell Electric Vehicles- FCEV1213,
2. Ceramic Direct Plated Copper- DPC1215,
3. Flexible Sputtering System- RTSP1215.
These 4 models machine are all with Octal chamber, flexible and
reliable performances are extensively used in various applications.
It satisfy the coating processes require multi different metal
layers: Al, Cr, Cu, Au, Ag, Ni, Sn, SS and many other
non-feeromagnetic metals;
plus the Ion source unit, efficiently enhance films adhesion on
different substrate materials with its plasma etching performance
and, the PECVD process to deposit some carbon-based layers.
Multi950 - Technical Specifications
Description | Multi-950 |
Deposition chamber (mm) Width x Depth x Heigh | 1050 x 950 x 1350 |
Deposition Sources | 1 pair of MF sputtering cathodes |
1 pair of PECVD | |
8 sets arc cathodes | |
Linear Ion Source | 1 set |
Plasma Uniformity Zone (mm) | φ650 x H750 |
Carousel | 6 x φ300 |
Powers (KW) | Bias: 1 x 36 |
MF: 1 x 36 | |
PECVD: 1 x36 | |
Arc: 8 x 5 | |
Ion Source: 1 x 5 | |
Gas Control System | MFC: 4 + 1 |
Heating System | 500℃, with thermalcouple PID control |
High Vacuum Gate Valve | 2 |
Turbomolecular pump | 2 x 2000L/S |
Roots Pump | 1 x 300L/S |
Rotary Vanes Pump | 1 x 90 m³/h + 1 x 48 m³/h |
Footprint (L x W x H ) mm | 3000 * 4000 * 3200 |
Total Power (KW) | 150 |
Royal Tech's service and engineering teams provide customer support
onsite, contact us for your applications!
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